Search
Navigation
Join our mailing list!
(Your shopping cart is empty)
Home
>
Chemical Heritage Foundation
>
Patterning the World: The Rise of Chemically Amplified Photoresists: Studies in Materials Innovation
Our Price:
$15.00
By
David C. Brock
Year:
2009
Pages:
21
Binding
Paperback
Product Code:
1437952771
Description
The rise of the Digital Age has been predicated on Moore’s law -- optimal economic advantage comes from an exponential increase in the performance of electronic components, accompanied by an exponential decrease in price. It is about semiconductor mfg. technol. In the early 1980s researchers in the semiconductor industry realized that the then dominant version of a central material on which semiconductor mfg. technol. was built -- photoresist -- would soon be insufficient. Therefore, a new form of photoresist would be required. This case study examines the innovation of the first of these “chemically amplified photoresists” by IBM in the 1980s. The case supports four findings with implications for our understanding of the nature of innovation.
Related Products...
Greatest Discoveries with Bill Nye: Chemistry
Our Price:
$69.95
Add
Dow Chemical Portrayed
Our Price:
$18.50
Add
Frontiers in Industrial Chemistry
Our Price:
$15.00
Add
Medicine, Science, and Merck
Our Price:
$30.00
Add
Donald Frederick and Mildred Topp Othmer
Our Price:
$24.95
Add
Share your knowledge of this product with other customers...
Be the first to write a review
Diane Publishing Co
PO Box 617
Darby, PA 19023-0617
1-800-782-3833
About Us
Become an Affiliate
Privacy Policy
Send Us Feedback
Company Info
|
Advertising
|
Product Index
|
Category Index
|
Help
|
Terms of Use
Copyright � 2004 Diane Publishing Company. All Rights Reserved.
Ecommerce Software
by Volusion.